Skip to main content

Thank you for visiting nature.com. You are using a browser version with limited support for CSS. To obtain the best experience, we recommend you use a more up to date browser (or turn off compatibility mode in Internet Explorer). In the meantime, to ensure continued support, we are displaying the site without styles and JavaScript.

  • Industry Perspective
  • Published:

EUV lithography

Lithography gets extreme

Nature Photonics volume 4, pages 24–26 (2010)Cite this article

Subjects

Extreme ultraviolet lithography extends photolithography to much shorter wavelengths and is a cost-effective method of producing more-advanced integrated circuits. Although some infrastructure challenges still remain, this technology is expected to begin high-volume microchip production within the next three years.

Access through your institution
Buy or subscribe

This is a preview of subscription content, access via your institution

Access options

Access through your institution

Buy this article

  • Purchase on SpringerLink
  • Instant access to full article PDF
Buy now

Prices may be subject to local taxes which are calculated during checkout

Figure 1: Since the mid-1980s, the wavelength of light used in lithography systems has reduced by almost half from 365 nm to 193 nm.

ASML

Figure 2
Figure 3: EUV sources for lithography applications based on laser- (left) or discharge-produced (right) plasmas of tin.

ASML

Acknowledgements

The authors would like to thank David Brandt of Cymer and Hans Meiling of ASML for their help in creating this article.

Author information

Authors and Affiliations

  1. Christian Wagner is Senior Product Manager of EUV at ASML, PO Box 324, 5500 AH Veldhoven, The Netherlands.,

    Christian Wagner

  2. Noreen Harned is Vice President of Marketing EUV at ASML, PO Box 324, 5500 AH Veldhoven, The Netherlands.,

    Noreen Harned

Authors
  1. Christian Wagner
    View author publications

    You can also search for this author inPubMed Google Scholar

  2. Noreen Harned
    View author publications

    You can also search for this author inPubMed Google Scholar

Corresponding author

Correspondence to Christian Wagner.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Wagner, C., Harned, N. Lithography gets extreme. Nature Photon 4, 24–26 (2010). https://doi.org/10.1038/nphoton.2009.251

Download citation

  • Issue Date:

  • DOI: https://doi.org/10.1038/nphoton.2009.251

Search

Advanced search

Quick links

Nature Briefing

Sign up for the Nature Briefing newsletter — what matters in science, free to your inbox daily.

Get the most important science stories of the day, free in your inbox. Sign up for Nature Briefing